发明名称 System and method for fabricating diodes
摘要 This invention is directed to a system and method of fabricating PN and PiN diodes by diffusing an acceptor impurity into a substrate. This invention is particularly advantageous for fabricating SiC diodes having linearly graded, deep pn junctions. One method that this invention uses to achieve its advantages is by diffusing an acceptor impurity into a substrate using a crucible, acceptor source, substrate, and furnace.
申请公布号 US2005184296(A1) 申请公布日期 2005.08.25
申请号 US20050111602 申请日期 2005.04.21
申请人 SUDARSHAN T.S.;SOLOVIEV STANISLAV;GAO YING 发明人 SUDARSHAN T.S.;SOLOVIEV STANISLAV;GAO YING
分类号 H01L;H01L29/15;H01L29/22;H01L29/24;H01L31/0312;H01L31/105;(IPC1-7):H01L29/15 主分类号 H01L
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