| 发明名称 |
METHOD FOR SELECTIVE ETCHING |
| 摘要 |
<p>Disclosed is a method of selective etching a first material on a substrate with a high selectivity towards a second material by flowing a liquid etchant across a substrate surface at a flow sufficient fast to generate a mininun mean velocity v parallel to the substrate's surface.</p> |
| 申请公布号 |
WO2005078783(A1) |
申请公布日期 |
2005.08.25 |
| 申请号 |
WO2005EP50510 |
申请日期 |
2005.02.07 |
| 申请人 |
SEZ AG;INTERUNIVERSITAIR MICRO-ELEKTRONICA CENTRUM VZW;KRAUS, HARALD;CLAES, MARTINE |
发明人 |
KRAUS, HARALD;CLAES, MARTINE |
| 分类号 |
H01L21/311;H01L21/336;(IPC1-7):H01L21/311 |
主分类号 |
H01L21/311 |
| 代理机构 |
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| 主权项 |
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