发明名称 METHOD OF WIPING DROPLET DISCHARGE HEAD, WIPING APPARATUS AND DROPLET DISCHARGE APPARATUS, ELECTRO-OPTIC DEVICE, METHOD OF MANUFACTURING ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To uniformly wipe and effectively clean a nozzle forming surface of a droplet discharge head in a wiping unit of a droplet discharge apparatus to wipe the droplet discharge head. SOLUTION: The wiping unit 100 of the droplet discharge apparatus 3 is constituted so as to control the atomizing quantity of a cleaning liquid in the sending direction of a wiping sheet 101. The atomization of the cleaning liquid is controlled so that the deposited quantity of the cleaning liquid on the wiping sheet 101 is fixed when each part of deposited region of the wiping sheet 101 on which the cleaning liquid is atomized and deposited reaches the nozzle forming surface of the droplet discharge head 21. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005224700(A) 申请公布日期 2005.08.25
申请号 JP20040035791 申请日期 2004.02.12
申请人 SEIKO EPSON CORP 发明人 MORI TOSHIMASA;FUJIMORI KAZUYOSHI
分类号 B41J2/165;B05C11/10;B05D1/26;B05D3/12;(IPC1-7):B05D3/12 主分类号 B41J2/165
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