发明名称 |
METHOD OF WIPING DROPLET DISCHARGE HEAD, WIPING APPARATUS AND DROPLET DISCHARGE APPARATUS, ELECTRO-OPTIC DEVICE, METHOD OF MANUFACTURING ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To uniformly wipe and effectively clean a nozzle forming surface of a droplet discharge head in a wiping unit of a droplet discharge apparatus to wipe the droplet discharge head. SOLUTION: The wiping unit 100 of the droplet discharge apparatus 3 is constituted so as to control the atomizing quantity of a cleaning liquid in the sending direction of a wiping sheet 101. The atomization of the cleaning liquid is controlled so that the deposited quantity of the cleaning liquid on the wiping sheet 101 is fixed when each part of deposited region of the wiping sheet 101 on which the cleaning liquid is atomized and deposited reaches the nozzle forming surface of the droplet discharge head 21. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005224700(A) |
申请公布日期 |
2005.08.25 |
申请号 |
JP20040035791 |
申请日期 |
2004.02.12 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MORI TOSHIMASA;FUJIMORI KAZUYOSHI |
分类号 |
B41J2/165;B05C11/10;B05D1/26;B05D3/12;(IPC1-7):B05D3/12 |
主分类号 |
B41J2/165 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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