| 发明名称 |
Sputtering target for manufacturing an optical recording medium |
| 摘要 |
A sputtering target for manufacturing an optical recording medium contains an alloy expressed by the following Formula (1); Ga alpha Sb beta where " alpha " and " beta " are each expressed in % by atom, and each satisfy the relations of: "5≤alpha≤20" and "80≤beta≤95." <IMAGE> |
| 申请公布号 |
EP1566801(A1) |
申请公布日期 |
2005.08.24 |
| 申请号 |
EP20050011265 |
申请日期 |
2003.06.04 |
| 申请人 |
RICOH COMPANY, LTD. |
发明人 |
HARIGAYA, MAKOTO;ITO, KAZUNORI;TASHIRO, HIROKO;MIZUTANI, MIKU;SHINOTSUKA, MICHIAKI;IWASA, HIROYUKI;SHINKAI, MASARU |
| 分类号 |
G03G7/00;G11B7/24;G11B7/2403;G11B7/24038;G11B7/241;G11B7/243;G11B7/2433;G11B7/252;G11B7/253;G11B7/2534;G11B7/254;G11B7/257;G11B7/258;G11B7/259;(IPC1-7):G11B7/24 |
主分类号 |
G03G7/00 |
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