| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing apparatus and a developing method, enabling a used developer to be re-utilized effectively for developing exposed substrates. SOLUTION: The developing apparatus 90 comprises a developing unit (DEV), having a means for holding exposed substrates, a means for applying the developer on the substrate, and a means for applying a rinsing liquid on the substrate applied with the developer, a recovery unit 80 for recovering the used developer drained from the developing unit (DEV), a developer regenerator 30 for mixing the used developer stored in the recovery unit 80 with a concentration control developer adjusted for a concentration higher than that of the developer, applied to the substrate to produce a developer of a prescribed concentration and a developer feeder 40 for sending the regenerated developer produced in the developer regenerator 30 to the developer applying means in the developing unit (DEV). |
