Laser-produced plasma EUV light source with isolated plasma

摘要

An EUV radiation source ( 40 ) that includes a nozzle ( 42 ) positioned a far enough distance away from a target region ( 50 ) so that EUV radiation ( 56 ) generated at the target region ( 50 ) by a laser beam ( 54 ) impinging a target stream ( 46 ) emitted from the nozzle ( 42 ) is not significantly absorbed by target vapor proximate the nozzle ( 42 ). Also, the EUV radiation ( 56 ) does not significantly erode the nozzle ( 42 ) and contaminate source optics ( 34 ). In one embodiment, the nozzle ( 42 ) is more than 10 cm away from the target region ( 50 ).