发明名称 Planarizing pads for planarization of microelectronic substrates
摘要 A planarizing pad for planarizing a microelectronic substrate, and a method and apparatus for forming the planarizing pad. In one embodiment, planarizing pad material is mixed with compressed gas to form a plurality of discrete elements that are distributed on a support material. At least a portion of the discrete elements are spaced apart from each other on the support material to form a textured surface for engaging a microelectronic substrate and removing material from the microelectronic substrate. The discrete elements can be uniformly or randomly distributed on the support material, and the discrete elements can be directly affixed to the support material or affixed to the support material with an adhesive.
申请公布号 US6932687(B2) 申请公布日期 2005.08.23
申请号 US20040772540 申请日期 2004.02.05
申请人 MICRON TECHNOLOGY, INC. 发明人 AGARWAL VISHNU K.;CHOPRA DINESH
分类号 B24B37/04;B24D3/28;B24D11/00;B24D18/00;(IPC1-7):B24B1/00 主分类号 B24B37/04
代理机构 代理人
主权项
地址