Device for Polishing Plasma Chamber Cathode Holes,申请号KR20050016263U-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Device for Polishing Plasma Chamber Cathode Holes
摘要
申请公布号	KR200393534(Y1)	申请公布日期	2005.08.22
申请号	KR20050016263U	申请日期	2005.06.08
申请人		发明人
分类号	H01L21/3065;(IPC1-7):H01L21/306	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Illumination device

Duet power-driven window shade

Vehicle display device

Haptic feedback device

Low noise amplifiers including group III nitride based high electron mobility transistors

Power-efficient multi-mode charge pump

Standard cell circuit, semiconductor integrated circuit, and semiconductor integrated circuit device

System and method to perform scan testing using a pulse latch with a blocking gate

Low supply voltage analog disconnection envelope detector

Digital multimeter

Inductor current measurement for DC to DC converters

Roof type charging apparatus using resonant power transmission

Auto-compensating system and method for condition monitoring of electrical machines

Linear walk arrangement

Backlight adjustment system

High pressure discharge lamp

OLED with flexible cover layer

Planar mirco-tube discharger structure and method for fabricating the same

Large-scale fabrication of vertically aligned ZnO nanowire arrays

Electric rotating machine