MASK PATTERN FOR FORMATION OF AN ISOLATED PATTERN, METHOD FOR FABRICATING THE SAME AND METHOD FOR FORMING AN ISOLATED PATTERN USING THE SAME,申请号KR19980004181-传众专利搜索

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发明名称	MASK PATTERN FOR FORMATION OF AN ISOLATED PATTERN, METHOD FOR FABRICATING THE SAME AND METHOD FOR FORMING AN ISOLATED PATTERN USING THE SAME
摘要
申请公布号	KR100510455(B1)	申请公布日期	2005.08.19
申请号	KR19980004181	申请日期	1998.02.12
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	SON, CHANG JIN;PARK, JUN SU
分类号	H01L21/027;(IPC1-7):H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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