MANUFACTURING METHOD OF SMALL PHOTORESIST PATTERN USING THERMAL FLOW PROCESS FOR SEMICONDUCTOR DEVICE,申请号KR19980000687-传众专利搜索

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发明名称	MANUFACTURING METHOD OF SMALL PHOTORESIST PATTERN USING THERMAL FLOW PROCESS FOR SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100510448(B1)	申请公布日期	2005.08.19
申请号	KR19980000687	申请日期	1998.01.13
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	KIM, CHANG HWAN;LEE, JUNG HYEON
分类号	H01L21/027;(IPC1-7):H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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