发明名称 Capping layers with high compressive stress for spin valve sensors
摘要 A capping layer employed with a spin valve sensor includes a first capping layer, formed from a refractory metal, and a second capping layer formed from silicon. The interface between the refactory metal layer and the silicon layer form a silicide that provides a large compressive stress on the underlying spin valve sensor. The compressive stress, advantageously, increases the pinning field in the self-pinned pinned layer structure, while providing a high resistivity so that less sense current is shunted by the capping layer structure compared to an all metal capping layer structure that provides a comparable compressive stress.
申请公布号 US2005180057(A1) 申请公布日期 2005.08.18
申请号 US20040779356 申请日期 2004.02.12
申请人 HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS, B.V 发明人 FREITAG JAMES M.;PINARBASI MUSTAFA M.
分类号 G11B5/127;G11B5/33;G11B5/39;(IPC1-7):G11B5/33 主分类号 G11B5/127
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