| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a forming method of a porous thin film with a high specific surface area efficiently and economically, which is preferable such as to a metal oxide semiconductor thin film for an electrode of a solar cell used after formed on a substrate, and to a thin film photocatalyst, to provide a dye-sensitized solar cell using a semiconductor electrode for the dye sensitized solar cell wherein the porous thin film of such as a porous metal compound thin film is formed by the forming method, and to provide a porous thin film photocatalyst deposited by the forming method. <P>SOLUTION: In the porous thin film forming method, the dye-sensitized solar cell and the porous thin film photocatalyst, a composite thin film, wherein a metal portion comprising a first metal component and a metal compound portion comprising a compound of a second metal component are mixed and dispersed each other, is formed on a substrate, by spattering using a target where metal comprising the first metal component is dispersed in the compound of the second metal component which is different from the first metal component, then only a metal portion in the composite thin film is removed. With such constitution, the porous thin film with the high specific surface area which is preferable such as to the semiconductor thin film for the electrode of the solar cell and to the thin film photocatalyst is efficiently and economically formed by conventional equipment without making a special design change. The dye-sensitized solar cell with the porous thin film used for the semiconductor electrode for the dye-sensitized solar cell exhibits excellent photoelectric conversion efficiency, and also an excellent photocatalyst performance is obtained when using the porous thin film as the thin film photocatalyst. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
