| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist for fine pattern formation excellent in both sensitivity and resolution. <P>SOLUTION: In a chemically amplified resist composition comprising an alkali-soluble base resin, a photoacid generator and a dissolution inhibitor in combination, at least one lone pair holding part capable of inducing hydrogen bonds sufficient to gather the alkali-soluble parts of the base resin to the molecule side of the dissolution inhibitor compound, e.g., a group containing oxygen atoms linked by a double bond, a specified alkoxy or alkoxycarbonyl group and (or) a halogen atom are incorporated into a cyclic or acyclic structure constituting a parent nucleus of a molecule of the dissolution inhibitor. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
