发明名称 |
PROCESS FOR PRODUCING WIRING BOARD AND PROCESS FOR FABRICATING ELECTRONIC DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To deposit a metal layer only at a required part and to form wiring by a simple production process. SOLUTION: The process for producing a wiring board comprises steps of: (a) providing a surfactant 18 in the first and second regions 12 and 14 of a substrate 10; (b) decomposing inter-atomic bonding in the second region 14 of the substrate 10 by irradiating that region with vacuum UV radiation 22; (c) removing the part of the surfactant 18 provided in the second region 14 by cleaning the substrate 10; (d) providing a catalyst 30 at the part of the surfactant 18 left in the first region 12; and (e) depositing a metal layer 34 on the catalyst 30 to form wiring of the metal layer 34 along the first region 12. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005223063(A) |
申请公布日期 |
2005.08.18 |
申请号 |
JP20040028117 |
申请日期 |
2004.02.04 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KIMURA SATOSHI;FURUHATA HIDEMICHI;MARUMO MINORU |
分类号 |
C23C18/20;C23C18/16;C23C18/28;H01L21/48;H01L21/60;H01L23/12;H01L23/498;H05K1/03;H05K3/18;H05K3/32;(IPC1-7):H05K3/18 |
主分类号 |
C23C18/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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