发明名称 |
STAGE CONTROL DEVICE AND METHOD THEREFOR, AND MANUFACTURING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a stage control device and a semiconductor manufacturing apparatus capable of realizing high precision stage control in drawing a circuit pattern on a sample. SOLUTION: The movement speed of the stage is estimated on the basis of position information of the stage from a laser interferometer serving to measure the position of the stage, and the movement speed of the stage is controlled on the basis of the movement speed. The movement speed of the stage is estimated on the basis of the rotary detector of a motor for moving the stage, and the movement speed of the stage is controlled on the basis of the movement speed. On the basis of the movement speeds of the stage estimated as above, a ratio of the controls of the movement speeds is determined. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005223163(A) |
申请公布日期 |
2005.08.18 |
申请号 |
JP20040030041 |
申请日期 |
2004.02.06 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
SUGAWARA TSUKASA;FUJII KEN |
分类号 |
H01L21/68;G03B27/58;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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