| 摘要 |
PROBLEM TO BE SOLVED: To provide a film thickness measuring apparatus capable of carrying out a highly precise film thickness measurement nondestructively in a short time, which is difficult to be carried out for a two-layer film composed of an ITO film and a PS film on a substrate for liquid crystal displays by using a conventional method. SOLUTION: Prescribed wavelength values are adopted with respect to film thickness values of the two-layer film composed of a photospacer film and a transparent conductive film which are formed on the substrate 8, and spectral reflection factors are measured with respect to the films of the two-layer film, and film thickness values are calculated by an arithmetic section 5, and a determination is made as to whether or not the calculated film thickness values are normal. COPYRIGHT: (C)2005,JPO&NCIPI
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