| 摘要 |
PROBLEM TO BE SOLVED: To detect with high accuracy a beam of a wide angle which is emitted from an optical system having high NA. SOLUTION: The projection aligner projects the pattern of an original edition 1 onto a substrate 2 via a projecting optical system 4. A sensor unit 27 for detecting light, made incident through the projecting optical system 4, is arranged on a wafer chuck 8. The sensor unit 27 includes a sealing window 21 and a light-receiving element 23, arranged so as to detect the light passed through the sealing window 21, and space between the sealing window 21 and the light-receiving element 23 is filled with a liquid 24. COPYRIGHT: (C)2005,JPO&NCIPI
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