| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holder wherewith no film formation occurs on the rear sides of substrates and wherewith substrates are automatically delivered for use in a process of forming specified films on the surfaces of substrates by using a process gas, and to provide a film formation processing apparatus. SOLUTION: In a wafer boat for use with a vertical heat treatment apparatus or the like, a plurality of mounts, each not smaller in size than a substrate and each having a mounting surface for mounting the circumference of a substrate, are arranged along a plurality of columns. Substrate delivery sections are provided, which move vertically in the spaces surrounded by the mounting surfaces and close the spaces when they are held by the mounts. Substrates are delivered to the substrate delivery sections when the substrate delivery sections are elevated higher than the mounts, and are mounted on the mounting surfaces when the substrate delivery sections fall down. COPYRIGHT: (C)2005,JPO&NCIPI
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