发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which removes by-products attaching to the surface of a PG/PBN ceramic heater and thereby can make the ceramic heater reusable. SOLUTION: The substrate treatment apparatus wet-washes a heating means, and then heats it up at a first temperature. Thereafter, it heats up a substrate stored in a treatment chamber to a desired temperature using the heating means which has been heat-dried at a second temperature higher than the first one. Since the wet-washed heating means is not heated rapidly, the surface state of the heating means is not ruined. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005223114(A) 申请公布日期 2005.08.18
申请号 JP20040028982 申请日期 2004.02.05
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 SAKUMA HARUNOBU;OKADA ITARU
分类号 H01L21/31;H01L21/02;(IPC1-7):H01L21/31 主分类号 H01L21/31
代理机构 代理人
主权项
地址