发明名称 |
SUBSTRATE TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which removes by-products attaching to the surface of a PG/PBN ceramic heater and thereby can make the ceramic heater reusable. SOLUTION: The substrate treatment apparatus wet-washes a heating means, and then heats it up at a first temperature. Thereafter, it heats up a substrate stored in a treatment chamber to a desired temperature using the heating means which has been heat-dried at a second temperature higher than the first one. Since the wet-washed heating means is not heated rapidly, the surface state of the heating means is not ruined. COPYRIGHT: (C)2005,JPO&NCIPI
|
申请公布号 |
JP2005223114(A) |
申请公布日期 |
2005.08.18 |
申请号 |
JP20040028982 |
申请日期 |
2004.02.05 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
SAKUMA HARUNOBU;OKADA ITARU |
分类号 |
H01L21/31;H01L21/02;(IPC1-7):H01L21/31 |
主分类号 |
H01L21/31 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|