| 摘要 |
The invention provides a method of forming a reflective electrode with a reduced number of manufacturing steps and a reduced cost, and provides a liquid crystal display device to which said method is applied. A resist coating is applied on a reflective electrode film ( 3 ). Then the resist coating is exposed to light and developed in such a way that the remaining portions ( 4 ) of the resist coating having a plurality of holes ( 4 a) remain. Then the reflective electrode film ( 3 ) is dry-etched using the remaining portions ( 4 ) as etching masks. Such a dry etching of the reflective electrode film ( 3 ) using the remaining portions ( 4 ) as etching masks forms a reflective electrode ( 30 ) having a plurality of holes ( 30 a) in each pixel. Further, since the thickness changing region ( 30 b) in which a thickness changes continuously is provided in the periphery of each hole ( 30 a), the reflective electrode ( 30 ) can have a desired reflective characteristics.
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