| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for forming a coating film which suppress the occurrence of transfer marks on the surface of a substrate and can prevent the attachment of particles to the rear face of the substrate. <P>SOLUTION: A resist applicator (CT) 23a comprises a stage 12 formed with a plurality of gas injection ports 16a for jetting out a gas, a substrate transfer mechanism 13 for transferring the LCD substrate G in the X direction on the stage 12, and a resist supply nozzle 14 for supplying a resist liquid onto the surface of the LCD substrate G during transportation of the LCD substrate G on the stage 12. The LCD substrate G is levitated nearly horizontally above the surface of the stage 12 by the gas jet out from the gas injection ports 16a, and is transferred in the levitated state on the stage 12 by means of the substrate transfer mechanism 13. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
