MULTIBEAM STEREOLITHOGRAPHY AND DEVICE FOR MICROSTRUCTURE USING DIFFERENT WAVELENGTH LASER BEAM

摘要

PROBLEM TO BE SOLVED: To provide a multibeam stereolithography for microstructures using different wavelength laser beams which has a three dimensional space selectivity on the nano level by using, in addition to a photocuring reaction-inducing laser beam, a reaction-promoting laser beam having a wavelength different from that of the photocuring reaction-inducing laser beam and a device for the multibeam stereolithography. SOLUTION: While a resin is irradiated with a photocuring reaction-inducing laser beam 4 at an intensity low enough not to induce photocuring reaction, the same spot of the resin is irradiated additionally with a reaction-promoting laser beam 5 with a different wavelength so that a photocuring reaction 6 takes place only in the neighborhood of the focused spot. COPYRIGHT: (C)2005,JPO&NCIPI