发明名称 |
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS |
摘要 |
<p>An Illumination system for a microlithographic projection expose apparatus has a light source (14) and a first optical raster element (18; 118; 218) that is positioned in or in close proximity to a first plane (24). The first plane is conjugated to a pupil plane (28) of the illumination system (10) by Fourier transformation. A second optical raster (30; 130; 230) element is positioned in or in close proximity to the pupil plane (28). A third optical raster (36; 136; 236) element is positioned in or in close proximity to a second plane (34) that is also con jugated to the pupil plane (28) by Fourier transformation. The third optical raster element (36; 136; 236), which can be a diffractive optical element, introduces an additional degree of design freedom for the modification of the angular distribution of the projection light bundle.</p> |
申请公布号 |
WO2005076083(A1) |
申请公布日期 |
2005.08.18 |
申请号 |
WO2004EP01129 |
申请日期 |
2004.02.07 |
申请人 |
CARL ZEISS SMT AG;SINGER, WOLFGANG;WANGLER, JOHANNES |
发明人 |
SINGER, WOLFGANG;WANGLER, JOHANNES |
分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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