发明名称 EXPOSURE APPARATUS AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the pollution of the inside of chambers of an exposure apparatus. SOLUTION: The exposure apparatus comprises a plurality of chambers 67A, 67B, 67C, which have openings 26, 27, 28, 29, respectively, through which the chambers 67A, 67B, 67C are connected to be able to communicate with each other; and blocking parts 36, 37, 38, 39, which block the inflow of a gas into at least one of the chambers 67A, 67B, 67C through any of the openings 26, 27, 28, 29, when the chambers 67A, 67B, 67C are separated. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005223011(A) 申请公布日期 2005.08.18
申请号 JP20040027125 申请日期 2004.02.03
申请人 CANON INC 发明人 MIYAJIMA GIICHI
分类号 G03B27/52;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03B27/52
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