发明名称 |
System and method for maskless lithography using an array of sources and an array of focusing elements |
摘要 |
A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate.
|
申请公布号 |
US2005181314(A1) |
申请公布日期 |
2005.08.18 |
申请号 |
US20050082629 |
申请日期 |
2005.03.16 |
申请人 |
GIL DARIO;MENON RAJESH;CARTER DAVID;SMITH HENRY I.;BARBASTATHIS GEORGE |
发明人 |
GIL DARIO;MENON RAJESH;CARTER DAVID;SMITH HENRY I.;BARBASTATHIS GEORGE |
分类号 |
G03F;G03F7/20;G21G5/00;G21K5/04;H01J37/317;H01L27/00;(IPC1-7):H01L27/00 |
主分类号 |
G03F |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|