发明名称 Solid state imaging device with increased vertical resolution in interlace scanning method
摘要 A solid state imaging device comprises a semiconductor substrate defining a two-dimensional surface, a plurality of photoelectric conversion elements disposed in a light receiving area of said semiconductor substrate in a plurality of rows and columns, an electric charge read-out device that reads out signal electric charges accumulated in said plurality of photoelectric conversion elements in interlace by dividing the signal electric charges in a plurality of fields, each field at least including the signal electric charges accumulated in the vertically adjacent photoelectric conversion elements corresponding to one color, and a vertical adding device that adds, for each field, the read-out signal electric charges divided into the plurality of fields. A solid state imaging device that can increase vertical resolution at a time of an interlace operation is provided.
申请公布号 US2005179798(A1) 申请公布日期 2005.08.18
申请号 US20050057751 申请日期 2005.02.15
申请人 FUJI PHOTO FILM CO., LTD. 发明人 YAMADA TETSUO
分类号 H01L27/148;H04N5/335;H04N5/341;H04N5/369;H04N5/3728;H04N9/04;H04N101/00;(IPC1-7):H04N5/335 主分类号 H01L27/148
代理机构 代理人
主权项
地址