发明名称 |
PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS,MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS |
摘要 |
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two -C F3 groups with reactants having cyclic groups. RF~ compositions such as RF- intermediates, RF-surfactants, RF-monomers, RF-~monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF~ urethanes, and/or RF-foam stabilizers. The RF portion can include at least two -CF3 groups, at least three -CF3 groups, and/or at least two -CF3 groups and at least two -CH2- groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam ("AFFF") formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
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申请公布号 |
CA2553930(A1) |
申请公布日期 |
2005.08.18 |
申请号 |
CA20052553930 |
申请日期 |
2005.01.28 |
申请人 |
GREAT LAKES CHEMICAL CORPORATION |
发明人 |
BRANDSTADTER, STEPHAN M.;NORMAN, EDWARD;EDWARDS, E. BRADLEY;LEMAN, GREGORY;SHARMA, VIMAL;KAUFMAN, ROBERT;CHIEN, JOHN;JACKSON, ANDREW;BOGGS, JANET;HEDRICK, VICTORIA |
分类号 |
C11D3/37;A01K31/02;A01N29/02;C07C17/00;C07C17/278;C07C19/08;C07C19/10;C07C19/14;C07C19/16;C07C21/18;C07C22/08;C11D3/24;C11D7/28;C11D11/00 |
主分类号 |
C11D3/37 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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