| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a macromolecular compound exhibiting high acid-eliminating tendency when used for a photoresist. <P>SOLUTION: The macromolecular compound contains recurring units corresponding to an unsaturated carboxylic acid hemiacetal ester represented by formula(1)( wherein, R<SP>a</SP>is H, a halogen atom, a 1-6C alkyl or a 1-6C haloalkyl; R<SP>b</SP>is a hydrocarbon group bearing hydrogen atom on the 1-site; R<SP>c</SP>is H or a hydrocarbon group; and R<SP>d</SP>is a cyclic skeleton-containing organic group ). This macromolecular compound may also contain recurring units corresponding to at least one monomer selected from a lactone skeleton-containing monomer, cyclic ketone skeleton-containing monomer, acid anhydride group-containing monomer and imido group-containing monomer, and/or recurring units corresponding to at least one monomer selected from a hydroxy group-containing monomer, mercapto group-containing monomer and carboxy group-containing monomer. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
