| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition cover with which the film quality of a film deposited on a substrate can be improved, and further, uniform film deposition can be applied to the surface of the substrate, and to provide a vacuum treatment system. <P>SOLUTION: The film deposition cover 10 is provided so as to be confronted with a flat electrode 11 on the grounded side supporting the substrate K to be treated and composed so as to surround a gas blow-off type ladder electrode 12 together with the flat electrode 11 on the grounded side. The face thereof confronted with the flat electrode 11 on the grounded side is provided with at least one exhaust hole 10a. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
