发明名称 SEMICONDUCTOR WAFER AND METHOD OF MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor wafer of SOS, SOQ, or the like and a method of manufacturing the same which do not cause warpage or fracture with a simple manufacturing process and perform accurate positioning with an optical sensor. SOLUTION: The semiconductor wafer is constituted of a translucent insulating substrate which has a slit for positioning on its periphery and made of sapphire and so on, and a silicon thin film which is formed over one surface of the insulating substrate. In the semiconductor wafer, ion is implanted to a region including the slit on the periphery of the silicon thin film to make silicon amorphous. Thus, translucency is eliminated on a point having been made amorphous, and accurate positioning can be performed with a conventional optical sensor. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005223304(A) 申请公布日期 2005.08.18
申请号 JP20040123638 申请日期 2004.04.20
申请人 OKI ELECTRIC IND CO LTD 发明人 UCHIDA HIROAKI
分类号 H01L21/00;H01L21/86;H01L27/12;(IPC1-7):H01L27/12 主分类号 H01L21/00
代理机构 代理人
主权项
地址