| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask unit comprising a pellicle, a pellicle frame and a photomask, wherein the inside of the pellicle frame is fast exchanged by a clean gas. <P>SOLUTION: An exchange gas guide passage 12 has an exchange gas inlet 11 to introduce the exchange gas into the pellicle space 17 and a gas entrance 13 to supply the exchange gas introduced from the exchange gas inlet 11 to the pellicle space 17. The member constituting the exchange gas guide passage 12 is made of a material having a function to adsorb dust and impurities. Further, a gas discharge passage 15 has a discharge exit 14 to discharge the gas from the pellicle space 17 and a discharge outlet 16 to send the discharged gas from the discharge exit to the outside of the pellicle frame. The member constituting the discharge passage 15 is made of a material having a function to adsorb dust and impurities. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
