发明名称 |
RESIN COMPOSITION FOR CLEANSING |
摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition to be used for cleansing processing molding machines for use in molding various resins. SOLUTION: The resin composition for cleansing comprises (A) 100 pts. mass of a base resin, (B) 0.1-20 pts. mass of an anionic surfactant containing≥50mass% of an alkanesulfonic acid or its salt and (C) 0.1-10 pts. mass of an alkylene glycol fatty acid ester. This composition is≥1.2 in swell ratio. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005220209(A) |
申请公布日期 |
2005.08.18 |
申请号 |
JP20040028862 |
申请日期 |
2004.02.05 |
申请人 |
DAICEL POLYMER LTD;DAICEL CHEM IND LTD |
发明人 |
TSUJIOKA KUNIO;SUZUKI SHINSUKE |
分类号 |
C08K5/42;C08K5/103;C08K5/49;C08L101/00;(IPC1-7):C08K5/42 |
主分类号 |
C08K5/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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