发明名称 |
ALIGNER AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE ALIGNER |
摘要 |
A circuit pattern having a size finer than a half of a wavelength of an exposure beam is transferred on a semiconductor wafer plane with an excellent accuracy by means of a mask whereupon an integrated circuit pattern is formed and a reduction projection aligner. The accuracy of transferring the circuit pattern on the semiconductor wafer is improved by synergic effects of super-resolution exposure, wherein a mask cover made of a transparent medium is provided on a pattern side of the integrated circuit mask so as to suppress the aberration of reduction projection alignment, and a method of increasing the number of actual apertures of the optical reduction projection lens system provided with the wafer cover made of the transparent medium on a photoresist side of the semiconductor wafer to which planarizing process is performed.
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申请公布号 |
WO2005076322(A1) |
申请公布日期 |
2005.08.18 |
申请号 |
WO2005JP01669 |
申请日期 |
2005.02.04 |
申请人 |
OKAMOTO, YOSHIHIKO;OGITA, MASAMI |
发明人 |
OKAMOTO, YOSHIHIKO;OGITA, MASAMI |
分类号 |
G03F1/14;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F1/14 |
代理机构 |
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地址 |
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