METHOD FOR CLEANING HARMFUL MATERIALS IN SEMICONDUCTOR WASTE GAS,申请号KR20040009264-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	METHOD FOR CLEANING HARMFUL MATERIALS IN SEMICONDUCTOR WASTE GAS
摘要
申请公布号	KR20050081035(A)	申请公布日期	2005.08.18
申请号	KR20040009264	申请日期	2004.02.12
申请人	FENG WU NIANG	发明人	FENG WU NIANG
分类号	H01L21/02;(IPC1-7):H01L21/02	主分类号	H01L21/02
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Method and apparatus for forming a closure device and a container

Continuously variable transmission

Method of fabricating wire member

Covering structure having automatic coupling system

Inbred corn line PHADP

Gaming machine with sorting feature

Channel estimation in a rake receiver of a CDMA communication system

Systems and methods for registering a substrate

Multipurpose functional unit with multiply-add and format conversion pipeline

Method of expelling ink from nozzles in groups, alternately, starting at outside nozzles of each group

Electromagnetic acoustic transducers for use in ultrasound inspection systems

Therapeutic substituted cyclopentanes

Inosine monophosphate dehydrogenase inhibitory phosphonate compounds

Substituted thiatriazaacenaphthylene-6-carbonitrile kinase inhibitors

Cyclic sulfamides for inhibition of gamma-secretase

Method for producing charge-trapping memory cell arrays

Condensed pyridines and pyrimidines with tie2 (TEK) activity

Network policy distribution

Network storage system