| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an acrylate or a methacrylate copolymer suitable for use as a resin component of a chemically amplified photoresist composition having high transparency to ArF excimer laser, exhibiting excellent sensitivity, a resist pattern shape, dry etching resistance and adhesion, having a high affinity to an alkali and capable of giving a good resist pattern by paddle development, and to provide a method for producing the same. <P>SOLUTION: The acrylate or the methacrylate copolymer having a constitutional unit represented by formula (a), wherein R<SP>1</SP>is a hydrogen atom or a methyl group, and a constitutional unite derived from acrylic or methacrylic acid containing an acid dissociating protective group, is produced by copolymerizing an acrylic or methacrylic ester of 3-hydroxy-1-oxacyclopentane-2-on with the acrylic or methacrylic acid with the acid dissociating protective group. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
