| 摘要 |
PROBLEM TO BE SOLVED: To present a method that further improves a determination of a distortion produced by a lens' faults while image-forming a mask structure on a substrate. SOLUTION: A mask with a structural arrangement which has a structure and an auxiliary structure assigned to it is projected onto a substrate. The structure has a width greater than the resolution limit of an exposure device, and the auxiliary structure has a width projected onto the substrate, which is smaller than its resolution limit. Exposure is selected such that underexposure arises, and after the development step, at least one of the auxiliary structures is generated onto the substrate. An image structure that is image-formed out of the auxiliary structure is detected using a microscope. Depending on the orientation of the auxiliary structure toward the structure, the width of the image-formed structure is amplified or attenuated by a lens' aberration that operates while an image is formed based on a lens system, in which case the attenuation may cause non-formation on the substrate. Accordingly, the detection brings about information on the direction and intensity of the lens aberration of a lens system used. COPYRIGHT: (C)2004,JPO&NCIPI |
