Laser produced plasma radiation system with contamination barrier

摘要

The system has a foil trap (24) positioned between a radiation source (32) and a normal incident (NI) - collector (22), such that radiation (34) coming from the radiation source passes the foil trap twice. The foil trap has lamellas positioned in respective planes such that they are parallel to both the radiation coming from the light source and the radiation reflected by the normal incident collector. Independent claims are also included for the following: (a) a lithographic system having a radiation system (b) a device manufacturing method.