发明名称 System and method for electron beam irradiation
摘要 An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings. <IMAGE>
申请公布号 EP1339085(A3) 申请公布日期 2005.08.17
申请号 EP20030251031 申请日期 2003.02.20
申请人 JEOL LTD.;SONY CORPORATION 发明人 NORIOKA, SETSUO;MIYOKAWA, TOSHIAKI;DATE, NAOKI;SASAKI, JUN;AKI, YUICHI;MIURA, YOSHIHISA
分类号 G21K5/04;A61N5/00;G01N23/00;G01Q30/02;G01Q30/20;G01T1/29;G11B7/004;G11B7/09;G11B7/26;G21G5/00;H01J37/04;H01J37/18;H01J37/20;H01J37/21;H01J37/252;H01J37/304;H01J37/305 主分类号 G21K5/04
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