Substrate cleaning apparatus and substrate cleaning method

摘要

A plurality of substrate holding pins 13 extend upright from a holding stage 12, and a substrate W is mechanically held in a circumferential direction with a back surface Sb of the substrate W faced up. Between the substrate W and the holding stage 12, a drip-proof plate 14 whose shape is approximately the same as that of the substrate W is disposed with a distance from the substrate W in such a manner that the drip-proof plate 14 covers a front surface (pattern-bearing surface) Sf of the substrate W from below. The drip-proof plate 14 disposed so as to cover the front surface Sf of the substrate W blocks the mist from splashing upon the front surface Sf of the substrate.