| 摘要 |
A method for photolithographical mass fabrication of hollow three-dimensional microstructures (14) comprises the steps of: provision of a photocurable material (8, FIG 3) on a substrate (7); provision of light-blocking impurities to the photocurable material to form a photocurable composite (9, FIG 4) having decreased transparency at the photo-curing wavelengths; provision of metal layers (10 FIG 5) to mask off the areas wherein the photocurable composite is not required; deforming the surface of the photocurable composite (FIG 6) when cooling from semi-solid to solid; selectively photopolymerizing the areas which correspond to the hollow microstructures to be formed; and removal of non-polymerized composite underneath the shells (14') of the hollow microstructures by heating (see arrows under item 7). |
