发明名称 Dual-energy electron flooding for neutralization of charged substrate
摘要 One embodiment disclosed relates to a method of electron beam inspection or review of a substrate having insulating materials therein. An area of the substrate is simultaneously exposed to a lower-energy electron beam and an overlapping higher-energy electron beam. The area is subsequently inspected with another electron beam. Another embodiment disclosed relates to an electron beam tool for examination of a substrate having insulating materials therein. A first cathode is configured as an electron source for a lower-energy electron beam, and a second cathode is configured as an electron source for a higher-energy electron beam. At least one electron lens is configured to focus the lower-energy electron beam and the higher-energy electron beam onto an overlapping area of a substrate. An electron beam column is subsequently used to examine the substrate.
申请公布号 US6930309(B1) 申请公布日期 2005.08.16
申请号 US20040809980 申请日期 2004.03.26
申请人 KLA-TENCOR TECHNOLOGIES CORPORATION 发明人 MANKOS MARIAN;PARKER DONALD J.
分类号 G01N23/225;G01Q30/02;H01J37/02;H01J37/26;(IPC1-7):H01J37/26 主分类号 G01N23/225
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