发明名称 |
Dual-energy electron flooding for neutralization of charged substrate |
摘要 |
One embodiment disclosed relates to a method of electron beam inspection or review of a substrate having insulating materials therein. An area of the substrate is simultaneously exposed to a lower-energy electron beam and an overlapping higher-energy electron beam. The area is subsequently inspected with another electron beam. Another embodiment disclosed relates to an electron beam tool for examination of a substrate having insulating materials therein. A first cathode is configured as an electron source for a lower-energy electron beam, and a second cathode is configured as an electron source for a higher-energy electron beam. At least one electron lens is configured to focus the lower-energy electron beam and the higher-energy electron beam onto an overlapping area of a substrate. An electron beam column is subsequently used to examine the substrate.
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申请公布号 |
US6930309(B1) |
申请公布日期 |
2005.08.16 |
申请号 |
US20040809980 |
申请日期 |
2004.03.26 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
MANKOS MARIAN;PARKER DONALD J. |
分类号 |
G01N23/225;G01Q30/02;H01J37/02;H01J37/26;(IPC1-7):H01J37/26 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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