| 发明名称 |
Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument |
| 摘要 |
A method of manufacturing a mask includes: attaching a second substrate having a plurality of penetrating holes to a first substrate having an opening. The second substrate is attached such that the penetrating holes are positioned within the opening. A groove is formed on a surface of the first substrate facing the second substrate. The groove is utilized to form a flow path between the first and second substrates.
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| 申请公布号 |
US6930021(B2) |
申请公布日期 |
2005.08.16 |
| 申请号 |
US20040790219 |
申请日期 |
2004.03.02 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
YOTSUYA SHINICHI |
| 分类号 |
H05B33/10;C23C14/04;H01L51/50;H01L51/56;H05B33/12;(IPC1-7):H01L21/30;H01L21/46 |
主分类号 |
H05B33/10 |
| 代理机构 |
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代理人 |
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| 主权项 |
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