发明名称 |
Drying resist with a solvent bath and supercritical CO2 |
摘要 |
A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath before a sufficient amount of the rinse liquid can evaporate from the object. The density of a solvent in the solvent bath depends on a direction of orientation of the polymeric film with respect to a force. The object is removed from the solvent bath. A drying process is performed.
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申请公布号 |
US6928746(B2) |
申请公布日期 |
2005.08.16 |
申请号 |
US20030367080 |
申请日期 |
2003.02.14 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ARENA-FOSTER CHANTAL J.;AWTREY ALLAN WENDELL;RYZA NICHOLAS ALAN;SCHILLING PAUL |
分类号 |
B81C1/00;F26B3/00;F26B5/06;G03F7/40;(IPC1-7):F26B3/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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