发明名称 |
Method of monitoring introduction on interfacial species |
摘要 |
A method for monitoring a nitridation process, including: (a) providing a semiconductor substrate; (b) forming a first dielectric layer on a top surface of the substrate; (c) introducing a quantity of interfacial species into the substrate; (d) removing the first dielectric layer; (e) forming a second dielectric layer on the top surface of the substrate; (f) measuring the density of interface traps between the substrate and the second dielectric layer; (g) providing a predetermined relationship between the quantity of the interfacial species and the density of the interface traps; and (h) determining the quantity of the interfacial species introduced based on the relationship.
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申请公布号 |
US6929964(B2) |
申请公布日期 |
2005.08.16 |
申请号 |
US20030605244 |
申请日期 |
2003.09.17 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GENICOLA LANCE;HURLEY MARK J.;KEMPISTY JEREMY J.;KIRSCH PAUL D.;RAMACHANDRAN RAVIKUMAR;HEDGE SURI |
分类号 |
H01L21/00;H01L21/28;H01L21/314;H01L21/318;H01L29/51;(IPC1-7):H01L21/66 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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