发明名称 Semiconductor device and manufacturing method of the same
摘要 A semiconductor device having a semiconductor layer, includes: a first impurity atom having a covalent bond radius larger than a minimum radius of a covalent bond of a semiconductor constituent atom of a semiconductor layer; and a second impurity atom having a covalent bond radius smaller than a maximum radius of the covalent bond of the semiconductor constituent atom; wherein the first and second impurity atoms are arranged in a nearest neighbor lattice site location and at least one of the first and second impurity atoms is electrically active.
申请公布号 US6930360(B2) 申请公布日期 2005.08.16
申请号 US20030609392 申请日期 2003.07.01
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YAMAUCHI JUN;AOKI NOBUTOSHI
分类号 H01L21/24;H01L21/22;H01L21/265;H01L21/336;H01L21/425;H01L27/148;H01L29/12;H01L29/772;H01L29/78;(IPC1-7):A01L29/72 主分类号 H01L21/24
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