发明名称 |
Semiconductor device and manufacturing method of the same |
摘要 |
A semiconductor device having a semiconductor layer, includes: a first impurity atom having a covalent bond radius larger than a minimum radius of a covalent bond of a semiconductor constituent atom of a semiconductor layer; and a second impurity atom having a covalent bond radius smaller than a maximum radius of the covalent bond of the semiconductor constituent atom; wherein the first and second impurity atoms are arranged in a nearest neighbor lattice site location and at least one of the first and second impurity atoms is electrically active.
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申请公布号 |
US6930360(B2) |
申请公布日期 |
2005.08.16 |
申请号 |
US20030609392 |
申请日期 |
2003.07.01 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
YAMAUCHI JUN;AOKI NOBUTOSHI |
分类号 |
H01L21/24;H01L21/22;H01L21/265;H01L21/336;H01L21/425;H01L27/148;H01L29/12;H01L29/772;H01L29/78;(IPC1-7):A01L29/72 |
主分类号 |
H01L21/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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