发明名称 |
METHOD AND APPARATUS FOR IRRADIATING LASER BEAM, METHOD AND APPARATUS OF MICRO MACHINING, AND METHOD AND APPARATUS FOR FORMING THIN FILM |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To efficiently perform separation at an atomic and molecular level and ionization (i.e. desorption ionization) at the atomic and molecular level, for example, on the surface of a solid. <P>SOLUTION: The value of an irradiation fluence, which is related to a femto-second laser beam in a low fluence region causing non-thermal ionization discharge on the surface of the solid by being irradiated thereon, is set within a low fluence range according to a required separation depth separated from the surface of the solid and the property of the surface of the solid. The femto-second laser beam is irradiated on the surface of the solid with the value of the irradiation fluence set as described above. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2005212013(A) |
申请公布日期 |
2005.08.11 |
申请号 |
JP20040020536 |
申请日期 |
2004.01.28 |
申请人 |
KYOTO UNIV |
发明人 |
SAKABE SHUJI;TAKANO MIKIO;HASHIDA MASAKI;SHIMIZU SEIJI |
分类号 |
B82B3/00;C23C14/28;(IPC1-7):B82B3/00 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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