| 摘要 |
A method for forming, by exposure to a lithographic beam ( 2 ), a groove ( 6 ) of material, exposed to a predetermined degree, in a surface layer ( 4 ) of an essentially flat substrate ( 3 ) rotatable about an axis ( 5 ), is characterized in that the lithographic beam ( 2 ) and the axis ( 5 ), during rotation of the substrate ( 3 ) about the axis, are controlled relative to each other so that part of the groove ( 6 ) is subjected to more than one exposure to the lithographic beam ( 2 ), the groove ( 6 ) being formed as a sum of said more than one exposure. Moreover, a device and a computer program product with instructions for controlling such a device according to the method are described.
|
