发明名称 Process for producing oxide superconductive thin-film
摘要 Provided is a method of producing an oxide superconducting film on a single-crystal substrate by depositing, on the single-crystal substrate, substances scattered from a raw material due to irradiation with laser beams according to a pulsed-laser deposition method, wherein the irradiation of the raw material is performed in a manner such that the repetition frequency of the pulse irradiation of the laser beams is divided into at least two steps. Thus, an oxide superconducting film having a high critical current density can be produced by the method.
申请公布号 US2005176585(A1) 申请公布日期 2005.08.11
申请号 US20040511268 申请日期 2004.10.20
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD 发明人 HAHAKURA SHUJI;OHMATSU KAZUYA
分类号 C23C14/08;C23C14/22;C23C14/28;H01L39/24;(IPC1-7):H01B1/00 主分类号 C23C14/08
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