发明名称 |
Process for producing oxide superconductive thin-film |
摘要 |
Provided is a method of producing an oxide superconducting film on a single-crystal substrate by depositing, on the single-crystal substrate, substances scattered from a raw material due to irradiation with laser beams according to a pulsed-laser deposition method, wherein the irradiation of the raw material is performed in a manner such that the repetition frequency of the pulse irradiation of the laser beams is divided into at least two steps. Thus, an oxide superconducting film having a high critical current density can be produced by the method.
|
申请公布号 |
US2005176585(A1) |
申请公布日期 |
2005.08.11 |
申请号 |
US20040511268 |
申请日期 |
2004.10.20 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD |
发明人 |
HAHAKURA SHUJI;OHMATSU KAZUYA |
分类号 |
C23C14/08;C23C14/22;C23C14/28;H01L39/24;(IPC1-7):H01B1/00 |
主分类号 |
C23C14/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|