发明名称 Apparatus and method for irradiating electron beam
摘要 An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.
申请公布号 US2005173654(A1) 申请公布日期 2005.08.11
申请号 US20050029810 申请日期 2005.01.04
申请人 TDK CORPORATION 发明人 USAMI MAMORU;TANAKA KAZUSHI;KANEKO YUKIO;ECHIGO NAOYUKI;TOMINAGA HIROSHI;KIZAKI AKIHIKO;OZAKI KUNIHIKO
分类号 A61L2/08;G21K5/00;G21K5/04;G21K5/10;(IPC1-7):G21K5/10 主分类号 A61L2/08
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