| 发明名称 |
Device manufacturing method and a substrate |
| 摘要 |
A method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus, in which a top coating is applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate.
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| 申请公布号 |
US2005175940(A1) |
申请公布日期 |
2005.08.11 |
| 申请号 |
US20040775326 |
申请日期 |
2004.02.11 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DIERICHS MARCEL MATHIJS T.M. |
| 分类号 |
G03F7/00;G03F7/20;(IPC1-7):G03F7/00 |
主分类号 |
G03F7/00 |
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